标题： 随机和定义序列光刻胶膜的空间统计比较 显示英文标题

标题： A Comparison of the Spatial Statistics of Random and Defined-Sequence Photoresist Films

摘要： 分辨率-线边缘粗糙度-灵敏度权衡促使人们探索使用定义序列聚合物和聚合物结合的光酸发生剂和淬灭剂来提高性能。 在本研究中，我们表征了由定义序列聚合物形成的正性光刻胶聚合物薄膜的内部结构，并将其与相同组成的随机共聚物进行比较。 我们对其成像进行建模，以连接初始到可显影的薄膜结构。 我们使用一种聚合物排列算法来模拟不同组成和光酸发生剂及淬灭剂位置的薄膜，使用ESCAP光刻胶的组成。 我们使用一种简单的极紫外光（EUV）曝光-去保护算法来模拟其中可显影图像的形成。 在所有情况下，定义序列聚合物薄膜中化学基团的空间分布几乎与随机共聚物无法区分。 我们评估了几种曝光-去保护场景，并发现某些情况下定义序列共聚物具有独特的可显影图像。 然而，在光刻胶层中使用定义序列聚合物并不一定会导致成像性能的提高，但它们确实具有一些与相同组成的随机聚合物不同的特性。 对这些特性的进一步研究可能会为纳米尺度成像过程的改进控制提供一条途径。 显示英文摘要

摘要： The resolution-line edge roughness-sensitivity tradeoff has motivated exploration of potential improvements using defined sequence polymers and polymer-bound photoacid generators and quenchers. In this study we characterize the internal structures of positive tone photoresist polymer films formed from defined sequence polymers and compare them to random copolymers of the same composition. We model their imaging to connect initial to developable film structures. We use a polymer packing algorithm to simulate films of diverse compositions and locations of photoacid generators and quenchers, using the composition of an ESCAP photoresist. We use a simple EUV exposure-deprotection algorithm to model developable image formation within them. In all cases, the spatial distribution of chemical moieties in the film for defined sequence polymers is nearly indistinguishable from random copolymers. We evaluate several exposure-deprotection scenarios, and find that a defined sequence copolymer has a distinctive developable image under certain circumstances. The use of defined sequence polymers within a photoresist layer does not automatically result in improved imaging, however they do have some characteristics different from random polymers of the same composition. Further study of these characteristics may provide a route to improved control over the nanoscale imaging process.