标题： 束敏感材料的非微扰阴极发光显微镜 显示英文标题

标题： Non-perturbative cathodoluminescence microscopy of beam-sensitive materials

摘要： 阴极发光显微镜现在已成为一种建立良好且强大的工具，用于探测纳米尺度材料的光子特性，但在许多情况下，为了获得合理的阴极发光信噪比，纳米光子材料容易受到电子束剂量的损害。 二维材料特别容易受到束诱导的修改，这既给高空间分辨率测量带来了障碍，也为束诱导的量子光子系统的图案化提供了机会。 在这里，应用了全色锐化技术来解决这些挑战，并实验展示了全色锐化在对束敏感材料进行最小干扰的高空间分辨率光谱成像中的潜力。 显示英文摘要

摘要： Cathodoluminescence microscopy is now a well-established and powerful tool for probing the photonic properties of nanoscale materials, but in many cases, nanophotonic materials are easily damaged by the electron-beam doses necessary to achieve reasonable cathodoluminescence signal-to-noise ratios. Two-dimensional materials have proven particularly susceptible to beam-induced modifications, yielding both obstacles to high spatial-resolution measurement and opportunities for beam-induced patterning of quantum photonic systems. Here pan-sharpening techniques are applied to cathodoluminescence microscopy in order to address these challenges and experimentally demonstrate the promise of pan-sharpening for minimally-perturbative high-spatial-resolution spectrum imaging of beam-sensitive materials.