标题： 非晶态$CaSO_{4}$纳米晶体沉积物用于硅界面的摩擦和磨损减少 显示英文标题

标题： Amorphous $CaSO_{4}$ nanocrystal deposits for friction and wear reduction at silicon interfaces

摘要： 当物体放置在表面上时，摩擦和磨损会导致其精确位置的不确定性，从而挑战精密制造。 在这里，我们探讨了一种牺牲性纳米晶体沉积物的发展，该沉积物可以抑制摩擦和磨损。 非晶态\ce{CaSO4}纳米晶体通过盐溶液液滴沉积后蒸发进行沉积。 在液滴干燥过程中，水性\ce{CaSO4}溶液的前驱体薄膜扩散到亲水性硅片上，从而在硅片表面均匀地形成无面的非晶态纳米晶体\ce{CaSO4}。 我们使用原子力显微镜研究了沉积纳米晶体的范围、形貌以及摩擦和磨损行为。 我们发现，牺牲层的纳米晶体易于应用和去除，在面积约为几厘米的大范围内具有约8纳米的恒定厚度，并且具有良好的摩擦和磨损行为。 显示英文摘要

摘要： When an object is placed on a surface, friction and wear cause uncertainty in its exact position, and thus challenge precision manufacturing. Here, we explore the development of a sacrificial nanocrystal deposit that can suppress friction and wear. Amorphous \ce{CaSO4} nancrystals are deposited through salt solution droplet deposition followed by evaporation. During droplet drying, a precursor film of the aqueous \ce{CaSO4} solution spreads onto a hydrophilic silicon wafer, thus nucleating evenly spread unfaceted amorphous nanocrystals of \ce{CaSO4} on the wafer surface. We used atomic force microscopy to study the extent, topography, and friction and wear behavior of the deposited nanocrystals. We find that the sacrificial layer of nanocrystals is easy to apply and remove, spreads over large (few cm) areas with a constant thickness of about 8 nm, and has favorable friction and wear behavior.