标题： 基于托普勒自成像效应的结构光荧光显微镜用于高通量可视化 显示英文标题

标题： Structured illumination fluorescence microscopy using Talbot self-imaging effect for high-throughput visualization

摘要： 我们报告了一种结构光照明（SI）显微技术的新扩展，该技术利用塔尔博特自成像效应在样品上生成SI图案，其视场（FOV）和分辨率不受显微镜物镜的数值孔径（NA）的限制。 这使得在大FOV范围内能够生成高分辨率的SI图案（达到自由空间传播极限），从而使得SI显微技术能够高效地适应高通量成像。 我们使用一个简单的原型显微镜来成像一个大FOV（450 x 350 μm），其衍射受限的荧光分辨率由显微镜NA限制为2 μm。 一个定制制造的结构元件，设计有超出显微镜成像物镜衍射极限的周期性空间特征，被放置在距离样品整数倍的半塔尔博特距离处。 通过塔尔博特自成像效应，在样品平面上生成了一个大FOV、亚衍射的SI图案。 然后使用传统的SI超分辨率原理，将整个FOV的成像分辨率提高到500 nm，大约是显微镜NA衍射极限的4倍改进。 这种方法也应适用于高通量亚衍射分辨率的多模态成像。 显示英文摘要

摘要： We report a novel extension to structured illumination (SI) microscopy that utilizes the Talbot self-imaging effect to generate a SI pattern on a sample with field-of-view (FOV) and resolution unconstrained by the numerical aperture (NA) of the microscope objective. This enables high-resolution SI pattern generation (up to the free-space propagation limit) across large FOVs, which in turn allows SI microscopy to be efficiently adapted for high-throughput imaging. We demonstrated this concept using a simple prototype microscope to image a large FOV (450 x 350 um) with a diffraction-limited fluorescence resolution limited by the microscope NA to 2 um. A custom-fabricated structured element, designed with periodic spatial features beyond the diffraction limit of the microscope imaging objective, was positioned to within an integer multiple of half the Talbot distance away from the sample. This generated a large FOV, sub-diffraction SI pattern at the sample plane via the Talbot self-imaging effect. Conventional SI super-resolution principles were then used to increase imaging resolution to 500 nm across the complete FOV, roughly a factor of 4 improvement over the microscope NA diffraction limit. This approach should also be applicable for high-throughput sub-diffraction resolution multimodal imaging.