标题： 掺杂CH4的氩基质中粒子的延迟爆发及自由基-自由基相互作用 显示英文标题

标题： Delayed burst of particles from Ar matrices doped with CH4 and radical-radical interaction

摘要： 在使用发射光谱方法的扩展浓度范围内，从1%到10%，研究了由电子辐射刺激的甲烷掺杂氩基质中粒子的延迟爆炸性脱附。 记录含有甲烷的氩基质的阴极发光（CL）光谱揭示了辐射诱导甲烷转化的以下产物：H、CH和C。进行了三个系列的实验，采用不同的辐射和加热模式：(i) 低温下连续辐射并积累辐射分解产物，(ii) 对预辐射薄膜进行加热并测量弛豫发射，特别是热刺激的外电子发射（TSEE），以及(iii) 在束流下对预辐射薄膜进行外部加热。 这些所谓的非稳态发光（NsL）在选定波长下的测量以及非稳态脱附（NsD）结合TSEE记录提供了有关感兴趣电荷和中性物种反应的信息。 考虑到CH自由基可以视为CH3物种的标志[27]，我们获得了关于氢原子和CH3自由基在促进甲烷掺杂氩基质中粒子爆炸性延迟脱附中的作用的信息。 在所有甲烷掺杂氩基质的低温稳定辐射过程中，观察到了两个长周期自振荡脉冲以及具有有限周期数的短周期自振荡。 讨论了导致粒子产率自振荡的过程。 显示英文摘要

摘要： The delayed explosive desorption of particles from Ar matrices doped with methane stimulated by an electron irradiation was studied in the extended concentration range from 1% to 10% using emission spectroscopy methods. Registration of the cathodoluminescence (CL) spectra of CH4-containig Ar matrices revealed following products of radiation-induced methane transformation: H, CH and C. Three series of experiments were performed with different irradiation and heating modes: (i) continuous irradiation at low temperature with accumulation of radiolysis products, (ii) heating of the pre-irradiated films with measurements of relaxation emissions, specifically thermally stimulated exoelectron emission (TSEE) and (iii) external heating of the pre-irradiated films under beam. These measurments of the, so called, nonstationary luminescenve (NsL) at the selected wavelenghs and nonstationary desorption (NsD) in combination with TSEE registration provided an information on reactions of charged and neutral species of interest. Taking into account that the CH radical can be considered as a signature of the CH3 species [27] we obtained the information on a role of H atoms and CH3 radicals in stimulation of explosive delayed desorption of particles from Ar matrices doped with methane. Two bursts of long-period self-oscillations together with short-period ones with a limited number of periods were observeed during stationary irradiation of all methane-doped Ar matrices at low temperatures. Processes leading to the self-oscillations of particle yield are discussed.