标题： 激发分子在金属薄膜中的圆形孔附近自发衰减率 显示英文标题

标题： Spontaneous decay rate of an excited molecule placed near a circular aperture in a metal film

摘要： 我们研究了处于有限厚度和有限电导率的金属薄膜中的圆形孔附近的激发分子的自发衰减率。 我们考虑了金属薄膜既悬浮在真空中又位于基底上的情况。 展示了分子的位置以及基底的存在对分子自发辐射速率的显著影响。 找到了可用于描述此过程的渐近线。 提取并比较了激发分子的总、辐射和非辐射自发衰减率。 这些结果可能在开发和解释使用扫描光学显微镜研究单个分子的实验以及基于通过纳米孔控制基本量子系统发射的光学纳米器件的设计中有用。 显示英文摘要

摘要： We have investigated the spontaneous decay rate of an excited molecule placed near a circular aperture in a metal film of finite thickness and finite conductivity. We have considered the metal film both suspended freely in vacuum and lying on a substrate. A significant effect of molecule the position and the presence of the substrate on the rate of spontaneous emission of the molecule is shown. The asymptotes which can be used to describe this process are found. Total, radiative, and non-radiative spontaneous decay rates of the excited molecule are extracted and compared. The results may be useful in the development and interpretation of experiments investigating a single molecule with a scanning optical microscope and in the design of optical nanodevices based on the control of elementary quantum systems emission with a nanohole.