标题： 用于超高真空的掩膜对准器，具有电容式距离控制 显示英文标题

标题： Mask aligner for ultrahigh vacuum with capacitive distance control

摘要： 我们介绍了一种由三个压电马达驱动的掩膜对准器，该设备在电容控制下引导并对准硅氮化物阴影掩膜，使其靠近样品表面。用于读出的三个电容器位于薄掩膜的背面，使得掩膜可以放置在距离样品表面$\mu$米的位置，同时保持与表面平行。样品和掩膜可以在原位进行更换，掩膜还可以额外沿表面平行移动。我们展示了沉积结构的边缘锐度低于 100 纳米，这可能受到沉积金在 Si(111) 上扩散的限制。 显示英文摘要

摘要： We present a mask aligner driven by three piezo motors which guides and aligns a SiN shadow mask under capacitive control towards a sample surface. The three capacitors for read out are located at the backside of the thin mask such that the mask can be placed in $\mu$m distance from the sample surface, while keeping it parallel to the surface. Samples and masks can be exchanged in-situ and the mask can additionally be displaced parallel to the surface. We demonstrate an edge sharpness of the deposited structures below 100 nm, which is likely limited by the diffusion of the deposited Au on Si(111).