标题： 暗物质-电子散射对银河系暗物质速度分布的依赖性 显示英文标题

标题： Dependence of Dark Matter - Electron Scattering on the Galactic Dark Matter Velocity Distribution

摘要： 暗物质与电子的散射速率取决于暗物质晕的潜在速度分布。重要的是，暗物质与电子的散射对高能尾部尤其敏感，而高能尾部在不同的暗物质晕模型之间存在显著差异。在这项工作中，我们总结了主要的晕模型，并讨论了其中涉及的各种参数。根据最近的研究和测量，我们推荐了这些参数的更新值。此外，我们量化了暗物质与电子散射速率对晕模型及其参数选择的依赖性，并展示了这些选择如何影响预测的截面限制。该速率对圆周速度 \(v_0\) 的变化最为敏感；在硅靶上，我们发现对于接触相互作用，速率预测的变化范围从 \(O(0.01\%)\) 到 \(O(100\%)\)，而对于长程相互作用，变化范围从 \(O(10\%)\) 到 \(O(100\%)\)。 显示英文摘要

摘要： The rate of dark matter-electron scattering depends on the underlying velocity distribution of the dark matter halo. Importantly, dark matter-electron scattering is particularly sensitive to the high-velocity tail, which differs significantly amongst the various dark matter halo models. In this work, we summarize the leading halo models and discuss the various parameters which enter them. We recommend updated values for these parameters based on recent studies and measurements. Furthermore, we quantify the dependence of the dark matter-electron scattering rate on the choice of halo model and parameters, and demonstrate how these choices propagate to the predicted cross-section limits. The rate is most sensitive to changes in the circular velocity v0; in silicon targets, we find that the changes in the rate predictions can range from O(0.01%) to O(100%) for contact interactions and O(10%) to O(100%) for long-range interactions.