标题： SHINE高重复率电子驱动表面缪子束流线的仿真研究 显示英文标题

标题： Simulation studies of a high-repetition-rate electron-driven surface muon beamline at SHINE

摘要： 高重复率脉冲μ子源在约50千赫兹下运行，有潜力提高涉及μ子的各种粒子物理和材料科学实验的灵敏度。 在本文中，我们提出利用SHINE设施的高重复率脉冲电子束来产生表面μ子束。 我们的模拟研究显示，8 GeV、100 pC电荷的脉冲电子束照射在铜靶上，每脉冲可产生高达$2 \times 10^{3}$个μ子。 束流线优化结果表明，大约每电子束团可有效传输60个表面μ子到束流线末端。 这表示当脉冲电子束以50 kHz运行时，表面μ子速率为$3 \times 10^{6}\,\mu^{+}$/秒，与现有的μ子设施相当。 这种高重复率脉冲μ子束，具有理想的时间结构，一旦建成，将代表一项独特且开创性的工作。 它为在具有GeV电子能量的现有电子机器上构建成本效益高的μ子源提供了一个模型。 除了传统μ子束流线中遇到的典型挑战，如靶站和束流线的安装和建设外，移除大量正电子也是一个主要挑战。 也讨论了这一问题的一个潜在解决方案。 显示英文摘要

摘要： A high-repetition-rate pulsed muon source operating at approximately 50\,kHz holds the potential to improve the sensitivity of various particle physics and material science experiments involving muons. In this article, we propose utilizing the high-repetition-rate pulsed electron beam at the SHINE facility to generate a surface muon beam. Our simulation studies indicate that an 8\,GeV, 100\,pC charge pulsed electron beam impinging on a copper target can produce up to $2 \times 10^{3}$ muons per pulse. Beamline optimization results demonstrate that approximately 60 surface muons per electron bunch can be efficiently transported to the end of the beamline. This translates to a surface muon rate of $3 \times 10^{6}\,\mu^{+}$/s when the pulsed electron beam is operated at 50\,kHz, which is comparable to existing muon facilities. This high-repetition-rate pulsed muon beam, with its ideal time structure, represents a unique and pioneering effort once constructed. It serves as a model for building cost-effective muon sources at existing electron machines with GeV electron energies. In addition to the typical challenges encountered in conventional muon beamlines, such as the installation and construction of the target station and beamline, the removal of substantial quantities of positrons is also a major challenge. A potential solution to this issue is also discussed.